Superhard Diamond Nanoparticles Used to Make Polishing Liquid

                                       Superhard Diamond Nanoparticles Used to Make Polishing Liquid

Spec:

1. C960: < 10nm, 99%

2. C961: 30-50nm, 99%

3. C962: 80-100nm, 99%

Application for Diamond nanoparticles:

1. Nanometer dual characteristics of both diamond and diamond nanoparticles with superhard characteristics, high specific surface area and spherical, etc., with this diamond powder slurry made of a very high quality finish can be polished table.

2. Key technologies of nano-diamond polishing liquid preparation of nano-diamond in the medium term stable dispersion, the role of the surfactant can be changed functional group composition and electrical properties of nano-diamond section, changing its dispersion in suspension.

3. Nano diamond polishing solution into aqueous and oily polishing liquid. As the aqueous polishing liquid has green, environmentally friendly feature, but also has the advantages of rapid cooling in the polishing process for high-speed polishing.

4. Whether the polishing liquid is an aqueous or oily are critical nano diamond prepared in the medium term, stable dispersion.

5. Nano diamond adsorption reactive groups containing oxygen, hydroxyl, carbonyl, carboxyl, ether group, an oxygen-containing reactive group and the reactive radical species and a nitrogen-containing organic compound or many adsorption, the presence of these surface groups, nano diamond dispersion in the medium may be provided.

6. Nano diamond dispersion technology using mechanical polishing + physical dispersion (ultrasonic dispersion and dispersion auxiliary mechanical stirring) + chemical dispersion successfully combine the three nanodiamond dispersed in oily or aqueous medium to obtain a stable dispersion of nano-diamond polishing liquid .

7.Via ultrasonic agitation nano diamond 20 ~ 100nm dispersed into small aggregates, the polishing liquid is made for a variety of photonics crystal, a computer hard disk substrate, an optical semiconductor components and integrated circuits connected to the ultra-precision copper polishing, the wafer for polishing, the surface roughness of 0.214nm.

8. Can be used as ultra-nano crystalline diamond polishing finishing materials, can greatly reduce the surface roughness; nano-diamond polishing materials used, the key technology is the use of dispersants, which can make nano diamond dispersants in oil well dispersed and suspended; In the polishing head, the dispersant preferably has an antistatic effect to eliminate the processing of static charge.